Precursor Chemicals
Precursors are indispensable key materials for thin-film deposition in semiconductor integrated circuit manufacturing. They are widely used in atomic layer deposition (ALD) and metal-organic chemical vapor deposition (MOCVD) processes, primarily including silicon precursors and metal precursors. These materials are critical for applications such as High-K dielectric layers and gate spacers, offering excellent electrical properties and process compatibility to ensure device yield and high performance.
Feature
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High Purity
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High Deposition Rate
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Low Deposition Temperature
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Excellent Deposition Uniformity
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Superior Step Coverage
Application
Chip
Product Series
